Description: Focused Ion Beam Systems Basics and Applications This edited volume, first published in 2007, comprehensively covers the focused ion beam and two beam technology. Nan Yao (Edited by) 9780521831994, Cambridge University Press Hardback, published 13 September 2007 408 pages 24.4 x 17 x 2.4 cm, 0.85 kg The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology. List of contributors Preface 1. Introduction to the focused ion beam system Nan Yao 2. Interaction of ions with matter Nobutsugu Imanishi 3. Gas assisted ion beam etching and deposition Hyoung Ho (Chris) Kang, Clive Chandler and Matthew Weschler 4. Imagining using electrons and ion beams Kaoru Ohya and Tohru Ishitani 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Rentjens and Lucille A. Giannuzzi 6. High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling E. L. Principe 7. Fabrication of nanoscale structures using ion beams Ampere A. Tseng 8. Preparation for physico-chemical analysis Richard Langford 9. In-situ sample manipulation and imaging T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani 10. Micro-machining and mask repair Mark Utlaut 11. Three-dimensional visualization of nanostructured materials using focused ion beam tomography Derren Dunn, Alan J. Kubis and Robert Hull 12. Ion beam implantation of surface layers Daniel Recht and Nan Yao 13. Applications for biological materials Kirk Hou and Nan Yao 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata and Takashi Kaito Index. Subject Areas: Electronic devices & materials [TJFD], Electronics engineering [TJF], Materials science [TGM], Mechanical engineering & materials [TG], Nanotechnology [TBN]
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BIC Subject Area 1: Electronic devices & materials [TJFD]
BIC Subject Area 2: Electronics engineering [TJF]
BIC Subject Area 3: Materials science [TGM]
BIC Subject Area 4: Mechanical engineering & materials [TG]
BIC Subject Area 5: Nanotechnology [TBN]
Number of Pages: 408 Pages
Language: English
Publication Name: Focused Ion Beam Systems: Basics and Applications
Publisher: Cambridge University Press
Publication Year: 2007
Subject: Engineering & Technology
Item Height: 244 mm
Item Weight: 850 g
Type: Textbook
Author: Nan Yao
Subject Area: Material Science, Mechanical Engineering, Nanotechnology
Item Width: 170 mm
Format: Hardcover
